Hsiuping University of Science and Technology Institutional Repository : Item 310993100/3776

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HUSTIR > College of Engineering > Department of Electronic Engineering > Patents > Item 310993100/3776

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/3776

Title:	多鐵性之鐵磁材料複合薄膜結構
Authors:	陳宏仁;高銘政;楊尚霖
Contributors:	修平科技大學
Date:	2013-04-21
Issue Date:	2013-08-28T03:12:56Z
Abstract:	一種多鐵性之鐵磁材料複合薄膜結構，其構成包含一基體、鐵電層、超巨磁阻磁性層，以及一多鐵材料層。該鐵電層化學式可為Bi3-xAxTi3O12，係設於該基體上；該超巨磁阻磁性層化學式可為La0.7-xLnxPb0.3MnO3，係設於該鐵電層上；該多鐵材料層化學式可為Bi1-xBxFeO3，係設於該超巨磁阻磁性層上。藉上述在層狀結構薄膜之鐵電性及鐵磁性交替作用下，令電場誘導產生磁場，同時磁場也可以誘發電極化，進而增強磁電效應。
Appears in Collections:	[Department of Electronic Engineering] Patents

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