Hsiuping University of Science and Technology Institutional Repository : Item 310993100/7975

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HUSTIR > College of Engineering > Department of Electronic Engineering > Monograph > Item 310993100/7975

Please use this identifier to cite or link to this item: http://ir.hust.edu.tw/dspace/handle/310993100/7975

Title:	製作鐵酸鉍参鋁箔膜於ITO基板上之特性研究
Authors:	盧仕勛;蔡丞冠;吳宇軒;施凱棠
Contributors:	電子工程系
Keywords:	製作鐵酸鉍参鋁箔膜於ITO基板上之特性研究
Date:	2022-06
Issue Date:	2022-12-05T02:13:49Z
Abstract:	本研究是利用溶膠-凝膠法，鐵酸鉍摻鋁元素(BiFeO3)薄膜，製作在透明玻璃片(ITO)基板上，鋁的摻量X為0%、2%、4%、6%、8%，並使用快速熱退火熱處理溫度為600度，量測BiFe1-xAlxO3 (x=0、0.02、0.04、0.06、0.08)薄膜的微結構、鐵電性特性，後續要再用RTA燒結600度，探討BiFe1-xAlxO3薄膜在ITO基板上成長的特性。
Appears in Collections:	[Department of Electronic Engineering] Monograph

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